co-deficient cemented tungsten carbide

In the present work, diamond films were deposited on Co-deficient Cemented Tungsten Carbide by microwave plasma chemical vapor deposition (MPCVD).
本文采用低Co硬质合金作为金刚石薄膜的基体材料,用微波等离子体化学气相沉积法(MPCVD)沉积金刚石薄膜。