magnetron sputtering

基本解释

• [电子] 磁控溅射；[电子] 磁控管溅射

英汉例句

双语例句

• Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
  沉积速率是磁控溅射镀膜技术中的一项重要指标，它由许多因素决定。
• The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
  从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
• The development, principle and applications of magnetron sputtering technique are introduced in this paper.
  该文介绍了磁控溅射沉积技术的基本原理、发展及应用。

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词组短语

短语

• magnetron plasma sputtering 多靶磁控溅射
• magnetron rf sputtering system 磁控射频溅射
• magnetron co sputtering 磁控共溅射
• dc magnetron reaction sputtering 直流磁控反应溅射
• DC magnetron reactive sputtering 直流磁控反应溅射

• magnetron sputtering更多词组

专业释义

机械工程

• 磁控溅射

  Titanium nitride thin film is deposited on Si(111) substrate by DC reactive magnetron sputtering.
  采用直流反应磁控溅射方法在Si(111)基底上沉积了氮化钛薄膜。

  电子、通信与自动控制技术

• 磁控溅射

  The results of this work are summarized as follow:1. We deposited ZnO films on different kinds of substrates by the method of RF magnetron sputtering.
  主要研究工作和结论如下:1、采用射频反应磁控溅射的方法,在不同衬底上制备了ZnO薄膜。

• 磁控管溅射
• 磁控溅镀