magnetron sputtering

常见例句

双语例句

• Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
  沉积速率是磁控溅射镀膜技术中的一项重要指标，它由许多因素决定。
• The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
  从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
• The development, principle and applications of magnetron sputtering technique are introduced in this paper.
  该文介绍了磁控溅射沉积技术的基本原理、发展及应用。
返回 magnetron sputtering